Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge

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منابع مشابه

High power impulse magnetron sputtering discharge

J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson, High power impulse magnetron sputtering discharge, 2012, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, (30), 030801. http://dx.doi.org/10.1116/1.3691832 Copyright: American Vacuum Society, This article may be downloaded for personal use only. Any other use requires prior permission of the author and the ...

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CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...

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Cross-field ion transport during high power impulse magnetron sputtering

In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS) has been investigated for the case of a planar circular magnetron. An important consequence of this type of transport is that it affects the way ions are being transported in the plasma. It was found that a significant fraction of ions are transported r...

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Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering

High power pulsed magnetron sputtering has been used to grow thin chromium layers on substrates facing and orthogonal to the target. It is demonstrated that at low peak target current density, jT < 0.6 A/cm 2 corresponding to a low ion-to-neutral flux ratio, films grown on substrates facing the target exhibit in-plane alignment. This is due to the rectangular shape of the target that yields an ...

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Pulsed DC Power Supplies for Dual Magnetron Sputtering

Key features of this waveform are the voltage boost period following each polarity transition and fast current rise time due to that boost. Ideally, the boost voltage would be adjustable. It is expected that adjusting the boost voltage will enable some tuning of the film properties, since it will effectively allow tuning of ion energy within the process. Additionally, adjustable duty, the ratio...

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ژورنال

عنوان ژورنال: Journal of Physics D: Applied Physics

سال: 2005

ISSN: 0022-3727,1361-6463

DOI: 10.1088/0022-3727/38/18/015